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III-V Lab facilities include:
- 2200 m2 of clean rooms (class 100 to 10 000) equipped with modern tools for opto- and micro-electronic device processing,
- several MBE, GS-MBE and MO-VPE reactors for epitaxial growth,
- numerous laboratories with the most sophisticated equipments for the characterization of ultra-fast opto-electronic devices and digital circuits, low noise and high power
microwave circuits characterizations,
- a design centre for digital and microwave circuits,
- a workshop for the assembly of complex opto-electronic and microwave modules and demonstrators.
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