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III-V Lab facilities

The III-V Lab facilities include:

  • 1200 m2 of clean rooms (class 10 000 or better) equipped with modern tools for opto- and micro-electronic device processing,
  • several MBE, GS-MBE and MO-VPE reactors for epitaxial growth,
  • numerous laboratories with the most sophisticated equipments for the characterization of ultra-fast opto-electronic devices and digital circuits, low noise and high power microwave circuits characterizations,
  • a design centre for digital and microwave circuits,
  • a workshop for the assembly of complex opto-electronic and microwave modules and demonstrators.


Room for coating and layer deposit

Reliability Room

Control with SEM

Photo-litho-development

Tests and Measurements

Design and Modelling Room

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