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III-V Lab facilities
The III-V Lab facilities include:
- 1200 m2 of clean rooms (class 10 000 or better) equipped with modern tools for opto- and micro-electronic device processing,
- several MBE, GS-MBE and MO-VPE reactors for epitaxial growth,
- numerous laboratories with the most sophisticated equipments for the characterization of ultra-fast opto-electronic devices and digital circuits, low noise and high power
microwave circuits characterizations,
- a design centre for digital and microwave circuits,
- a workshop for the assembly of complex opto-electronic and microwave modules and demonstrators.

Room for coating and layer deposit |
 Reliability Room |
 Control with SEM |

Photo-litho-development |
 Tests and Measurements |  Design and Modelling Room |
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